Storage element and storage apparatus

ABSTRACT

A storage element includes a layer structure including a storage layer having a direction of magnetization which changes according to information, a magnetization fixed layer having a fixed direction of magnetization, and an intermediate layer disposed therebetween, which intermediate layer contains a nonmagnetic material. The magnetization fixed layer has at least two ferromagnetic layers having a direction of magnetization tilted from a direction perpendicular to a film surface, which are laminated and magnetically coupled interposing a coupling layer therebetween. This configuration may effectively prevent divergence of magnetization reversal time due to directions of magnetization of the storage layer and the magnetization fixed layer being substantially parallel or antiparallel, reduce write errors, and enable writing operation in a short time.

CROSS REFERENCES TO RELATED APPLICATIONS

The present Application is a Continuation Application of U.S. patentapplication Ser. No. 17/090,321 filed Nov. 5, 2020, which is aContinuation Application of U.S. patent application Ser. No. 16/777,222filed Jan. 30, 2020, now U.S. Pat. No. 10,854,256 issued Dec. 1, 2020,which is a Continuation Application of U.S. patent application Ser. No.16/408,840 filed May 10, 2019, now U.S. Pat. No. 10,580,471 issued Mar.3, 2020, which is a Continuation Application of U.S. patent applicationSer. No. 15/943,361 filed Apr. 2, 2018, now U.S. Pat. No. 10,332,577issued on Jun. 25, 2019, which is a Continuation Application of U.S.patent application Ser. No. 15/658,862 filed Jul. 25, 2017, now U.S.Pat. No. 9,997,698 issued on Jun. 12, 2018, which is a ContinuationApplication of U.S. patent application Ser. No. 15/233,468 filed Aug.10, 2016, now U.S. Pat. No. 9,748,470 issued on Aug. 29, 2017, which isa Continuation Application of U.S. patent application Ser. No.14/354,760 filed Apr. 28, 2014, now U.S. Pat. No. 9,444,034 issued onSep. 13, 2016, which is a 371 National Stage Entry of InternationalApplication No. PCT/JP2012/006989, filed on Oct. 31, 2012, which in turnclaims priority from Japanese Application No. 2011-261520, filed on Nov.30, 2011, the entire contents of which are incorporated herein byreference.

TECHNICAL FIELD

The present disclosure relates to storage elements, and storageapparatuses, for recording by using spin-torque magnetization reversal.

BACKGROUND ART

With rapid development in various information devices from mobileterminals to large-capacity server, more and more improved performancesuch as high integration, high speed and low power consumption regardingthe memory, logic, and other elements for making up such informationdevices has been pursued.

Specifically, remarkable progress has been made in semiconductornon-volatile memories, and flash memories as large-capacity filememories have come into wide use as if they can replace hard disks.

Meanwhile, considering expansion of the development into code storageand working memories as well, development of semiconductor non-volatilememories has been underway to replace NOR flash memories, DRAMs, and thelike which have been currently generally used. Examples of thesemiconductor non-volatile memories include FeRAM, (Ferroelectric RandomAccess Memory), MRAM (Magnetic Random Access Memory), PCRAM (phasechange RAM) and the like. Some of them have already been implemented.

Among these non-volatile memories, MRAMs are capable of high-speedrewriting, and also almost infinite times (more than 10¹⁵ times) ofrewriting, for they perform data storage by using magnetizationdirection of a magnetic material. They have already been utilized in thefield of industrial automation, aircrafts and the like.

For their high-speed operation and reliability, MRAMs are expected to bedeveloped in code storage and working memories hereafter.

However, MRAMs may still have a problem in achieving low powerconsumption and large capacity.

This may be a substantial problem coming from the principle of recordingin MRAM, that is, a method of reversing magnetization by a currentmagnetic field produced by a wiring.

One example of the methods to cope with this problem under study is arecording method which does not depend on a current magnetic field(i.e., magnetization reversal). Among such studies, those regardingspin-torque magnetization reversal have been actively carried out (forexample, see Patent Documents 1 and 2).

A storage element using the spin-torque magnetization reversal may beconfigured by MTJ (Magnetic Tunnel Junction), which is the same as inMRAMs.

This utilizes a fact that when spin-polarized electrons passing througha magnetic layer fixed to a certain orientation enter another magneticfree layer (without fixed orientation), the spin-polarized electronexert spin torque on the magnetic free layer. When a current above acertain threshold flows, a free magnetization layer (storage layer)would reverse its direction of magnetization.

Rewriting of 0/1 is made by changing the polarity of a current which isallowed to flow in the storage element.

An absolute value of the current for reversal of the direction ofmagnetization of the free magnetization layer is typically 1 mA or lessin a 0.1 μm-scale storage element. Moreover, as this value of thecurrent decreases proportionally to a volume of the storage element,scaling may be possible.

Furthermore, as it eliminates the need of word lines for producing thewrite current magnetic field, it may have an advantage that a cellstructure can be simple.

Hereinafter, an MRAM using the spin-torque magnetization reversal willbe referred to as “STT-MRAM (Spin Transfer Torque-Magnetic Random AccessMemory)”.

There is a great expectation in STT-MRAMs as non-volatile memories whichare capable of realizing low power consumption and large capacity whilekeeping advantages of MRAMs where high speed and almost infinite timesof rewriting is available.

Patent Document 1: Japanese Patent Application Laid-open No. 2003-17782

Patent Document 2: U.S. Pat. No. 5,695,864

DISCLOSURE OF THE INVENTION Problem to be Solved by the Invention

In STT-MRAMs, a size of a spin torque which induces the magnetizationreversal would vary depending on the direction of magnetization.

In normal structures of storage elements in STT-RAMs, a magnetizationangle in which the spin torque is zero exists.

When a magnetization angle in the initial state coincides with such anangle, the time required for magnetization reversal would becomesignificantly large. Consequently, there may be some cases thatmagnetization reversal is not completed within a write time.

If the reversal is not completed within the write time, such writingoperation would result in failure (write error), where a normal writeoperation cannot be performed.

An object of the present disclosure is to provide a storage element anda storage apparatus capable of effectively preventing generation oferrors and performing writing operation in a short time.

Means for Solving the Problem

In order to solve the problems described above, a storage elementaccording to the present disclosure is configured as in the following.

That is, the storage element according to the present disclosureincludes layer structure. The layer structure at least includes astorage layer having a direction of magnetization to be changedaccording to information, a magnetization fixed layer having a fixeddirection of magnetization, and an intermediate layer containing anonmagnetic material disposed between the storage layer and themagnetization fixed layer. Recording of the information is to beperformed by allowing a current to flow in the layer structure in itslamination direction to cause change in the direction of magnetizationof the storage layer.

The magnetization fixed layer has two ferromagnetic layers laminatedinterposing a coupling layer therebetween, the ferromagnetic layersbeing magnetically coupled interposing the coupling layer, theferromagnetic layers having a direction of magnetization being tiltedfrom a direction perpendicular to a film surface.

Furthermore, a storage apparatus according to the present disclosureincludes the storage element according to the present disclosure, and awiring portion for supplying a current which flows in the laminationdirection to the storage element, and a current supply control sectionfor controlling supply of the current to the storage element via thewiring portion.

As described above, in the storage element according to the presentdisclosure, the direction of magnetization of the ferromagnetic layersforming the magnetization fixed layer is tilted from a directionperpendicular to the film surface. This makes it possible to effectivelyprevent expansion of magnetization reversal time due to a state wherethe directions of magnetization of the storage layer and themagnetization fixed layer become substantially parallel or antiparallel.That is, it makes it possible to perform writing of information byreversing the direction of magnetization of the storage layer in apredetermined finite time.

Further, the storage apparatus according to the present disclosureallows a current to flow through the wiring portion to the storageelement in the lamination direction, and thus enables to perform writingof information by reversing the direction of magnetization of thestorage layer.

Effects of the Invention

According to the present disclosure, as it makes it possible to performwriting of information by reversing the direction of magnetization ofthe storage layer in a predetermined time, write errors can be reducedand writing operation may be made in a shorter time.

Since the write errors can be reduced, it can improve reliability ofwriting operation.

Further, since the writing operation may be made in a shorter time, itcan realize high-speed operation.

Therefore, according to the present disclosure, it makes it possible torealize a storage apparatus and a storage apparatus which are highlyreliable in writing operation and operate at high speed.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 A schematic perspective view of a storage apparatus of anembodiment.

FIG. 2 A cross-sectional view of the storage apparatus of theembodiment.

FIG. 3 A plan view of the storage apparatus of the embodiment.

FIG. 4 An explanatory drawing (cross-sectional view) of a schematicconfiguration of an STT-MRAM in the past, in which the direction ofmagnetization is perpendicular to the film surface.

FIG. 5 A schematic diagram (cross-sectional view) of a storage elementas a first embodiment.

FIG. 6 Figures showing a configuration of a magnetization fixed layer ofthe first embodiment in detail.

FIG. 7 A figure where a range of magnetic coupling energy is plotted.

FIG. 8 A schematic diagram (cross-sectional view) of a storage elementof a second embodiment.

FIG. 9 Figures showing a configuration of a magnetization fixed layer ofthe second embodiment in detail.

FIG. 10 A figure showing a relationship between excitation energy andreversal time, at a certain current.

FIG. 11 Figures showing an application example of a storage element(magneto-resistive element) of an embodiment applied to a compositemagnetic head.

MODE(S) FOR CARRYING OUT THE INVENTION

Hereinafter, some embodiments of the present disclosure will bedescribed in the following order.

[1. Schematic Configuration of Storage Apparatus of Embodiment]

[2. Overview of Storage Apparatus of Embodiment]

[3. First Embodiment (Specific Configuration Example 1)]

[4. Second Embodiment (Specific Configuration Example 2)]

[5. Simulation Result]

[6. Variation Examples]

1. Schematic Configuration of Storage Apparatus of Embodiment

First, a schematic configuration of a storage apparatus will bedescribed.

Schematic drawings of the storage apparatus are shown in FIGS. 1 to 3 .FIG. 1 is a perspective view; FIG. 2 is a cross-sectional view; and FIG.3 is a plan view.

As shown in FIG. 1 , a storage apparatus of an embodiment includes astorage element 3 made of STT-MRAM (Spin Transfer Torque-Magnetic RandomAccess Memory), which can hold information by a magnetization state,being disposed at each of intersections of two types of address wirings(for example, word lines and bit lines).

That is, to a portion which is isolated by element isolation layers 2 ofa semiconductor substrate 10 such as a silicon substrate, there are adrain region 8, source region 7 and a gate electrode 1 being formed tomake up each selection transistor for selecting each of the storageelements 3. Among the above, the gate electrodes 1 also serve as one ofthe address wirings (word lines) which extend in the forward-backwarddirection in the figure.

The drain region 8 is formed mutually in the selection transistors ofright and left in FIG. 1 . A wiring 9 is connected to this drain region8.

Further, between each source region 7 and a bit line 6 extending fromright to left in FIG. 1 , the storage element 3 that includes a storagelayer having a direction of magnetization to be reversed by spin-torquemagnetization reversal is disposed. For example, this storage element 3may be made of a magnetic tunnel junction element (MTJ element).

As shown in FIG. 2 , the storage element 3 has two magnetic layers 12and 14. Among the two magnetic layers 12 and 14, one magnetic layer willbe a magnetization fixed layer 12 having a fixed direction ofmagnetization M12. Another magnetic layer will be a magnetization freelayer, that is, a storage layer 14 in which a direction of magnetizationM14 can change.

Further, the storage element 3 is connected to the bit line 6 and thesource region 7 via respective contact layers 4 above and under thestorage element 3.

This would allow a current to flow via the two types of address wirings1 and 6 to the storage element 3 in a vertical direction (laminationdirection), and thus, the direction of magnetization M14 of the storagelayer 14 can be reversed by spin-torque magnetization reversal.

As shown in FIG. 3 , the storage apparatus is made with the storageelements 3 disposed at the respective intersections of a large number offirst wirings (word lines) 1 and second wirings (bit lines) 6.

The storage element 3 may have a round planar shape and have a sectionalconfiguration as shown in FIG. 2 .

Further, the storage element 3 includes the magnetization fixed layer 12and the storage layer 14.

With each storage element 3, a memory cell of the storage apparatus isformed.

In such a storage apparatus, writing should be performed at a currentless than or equal to the saturation current of the selectiontransistor. Since the saturation current of the transistor is known tobe lower with miniaturization, it would be favorable to improve thespin-transfer efficiency and reduce the current that flows through thestorage element 3, for miniaturizing the storage apparatus.

Further, in order to produce a large readout signal, a highmagnetoresistance change rate should be ensured, and for this purpose,it would be effective to employ an MTJ structure as mentioned above,that is, to employ a configuration of the storage element 3 where atunnel insulating layer (tunnel barrier layer) is provided as anintermediate layer between the two layers of magnetic layers 12 and 14.

When thus employed the tunnel insulating layer as the intermediatelayer, the current which can flow through the storage element 3 would belimited so that the tunnel insulating layer be prevented from breakdown.Accordingly, it would be favorable to reduce the current required forspin-torque magnetization reversal, also in view of ensuring reliabilityof the storage element 3 in repetition of writing. Incidentally, thecurrent required for spin-torque magnetization reversal may also becalled inversion current, storage current, and the like.

In addition, since the storage apparatus of the embodiment is anon-volatile memory device, it is demanded that the information writtenby the current be stably stored. In other words, stability againstthermal fluctuations (heat stability) of magnetization of the storagelayer 14 should be ensured.

If the heat stability of the storage layer 14 is not ensured, adirection of magnetization that has been reversed may be re-reversed dueto heat (temperature in operating environment) and may result inretention error.

The storage element 3 (STT-MRAM) in this storage apparatus may have anadvantage in scaling, as compared to the MRAM of the past, that is, thevolume thereof may be reduced. However, provided that othercharacteristics be the same, a smaller volume of the element would tendto result in lower heat stability.

When realizing large capacity of STT-MRAM, the volume of the storageelement 3 would be further reduced, and therefore, ensuring heatstability may be a major matter.

Accordingly, heat stability may be important characteristics for thestorage element 3 in the STT-RAM, and the element should be designed sothat the heat stability can be ensured while the volume thereof isreduced.

2. Overview of Storage Apparatus of Embodiment

Next, an overview of a configuration of the storage element 3 of theembodiment will be described.

First, referring to the cross-sectional view of FIG. 4 , a schematicconfiguration of a storage element 3′ having an STT-MRAM in the past, inwhich the direction of magnetization is perpendicular to the filmsurface, will be described.

It should be noted that, as can be understood from the descriptionbelow, in the storage element 3 according to the present embodiment, thedirection of magnetization M12 of the magnetization fixed layer 12 isnot perpendicular to the film surface. However, in this illustrationwith reference to FIG. 4 , the reference numeral “12” will be used forconvenience to denote a magnetization fixed layer contained in thestorage element 3′ of the past.

As shown in FIG. 4 , the storage element 3′ includes a base layer 11,and, a magnetization fixed layer (also called a reference layer) 12having a fixed direction of magnetization M12, an intermediate layer(nonmagnetic layer: tunnel insulating layer) 13, the storage layer(magnetization free layer) 14 having a direction of magnetization M14which is variable, and a cap layer 15, which are laminated on top of thebase layer 11 in this order.

Among these, the magnetization fixed layer 12 has the direction ofmagnetization M12 thereof fixed, due to high coercive force and thelike. In the illustration according to this figure, the direction ofmagnetization is fixed to a direction perpendicular to the film surface.

The storage element 3′ may store information by the direction ofmagnetization (magnetic moment) M14 of the storage layer 14 havinguniaxial anisotropy.

Writing of the information to the storage element 3′ may be performed byallowing a current to flow in the direction perpendicular to the filmsurfaces of the layers of the storage element 3′ (that is, thelamination direction of the layers), to cause spin-torque magnetizationreversal in the storage layer 14.

Now, spin-torque magnetization reversal will be briefly described.

Electrons have two spin angular momentums. They can be preliminarydefined as spin up and spin down.

A nonmagnetic material has the same number of spin-up electrons andspin-down electrons, in its inside. On the other hand, a ferromagneticmaterial has a difference in the number of spin-up electrons andspin-down electrons inside.

First, a case where two layers of ferromagnetic material (themagnetization fixed layer 12 and the storage layer 14), which arelaminated interposing the intermediate layer 13, have their directionsof the magnetizations M12 and M14 in an antiparallel state, and someelectrons are moved from the magnetization fixed layer 12 to the storagelayer 14, will be assumed.

In the electrons which have passed through the magnetization fixed layer12, there would be a spin polarization, that is, a difference in thenumber of spin-up electrons and spin-down electrons.

If the intermediate layer 13 as a tunnel insulating layer is thinenough, the electrons may reach the other ferromagnetic material, whichis the storage layer (magnetization free layer) 14, before the spinpolarization relaxes and comes into a nonpolarized state (the samenumber of spin-up and spin-down) as in a normal nonmagnetic material.

Then, since the two layers of ferromagnetic material (the magnetizationfixed layer 12 and the storage layer 14) have spin polarization degreeswith opposite signs to each other, some of the electrons would bereversed, that is, they would change the direction of the spin angularmomentum, in order to reduce energy of the system. At this time, sincethe total angular momentum of the system should be conserved, a reactionequal to the sum of changes in the angular momentum according to theelectrons which changed the directions would be given to themagnetization M14 of the storage layer 14.

In cases where an amount of current, that is, the number of electronspassing per a unit of time is small, the total number of the electronschanging the directions would be small and the resulting change in theangular momentum which occurs to the magnetization M14 of the storagelayer 14 would be small. However, if the current is increased, a largechange in the angular momentum may be given per a unit of time.

A time change in the angular momentum is a torque, and when the torqueexceeds a certain threshold, a precession of the magnetization M14 ofthe storage layer 14 would start. The magnetization M14 becomes stableafter being turned by 180 degrees, due to the uniaxial anisotropy of thestorage layer 14. That is, a reversal from the antiparallel state to theparallel state takes place.

On the other hand, in a case where the two layers 12 and 14 have theirmagnetizations M12 and M14 in a parallel state, when a current isallowed to flow in an opposite direction so that the electrons are sentfrom the storage layer 14 to the magnetization fixed layer 12, theelectrons would be reflected by the magnetization fixed layer 12.

Then, the reflected electrons with the direction of the spin reversedwould exert torque when they enter the storage layer 14. This allows thedirection of magnetization M14 of the storage layer 14 to be reversed,and allows the directions of the magnetizations M12 and M14 to bereversed with respect to each other to come into the antiparallel state.

However, the amount of current required for causing reversal at thistime would be greater than in the case of the reversal from theantiparallel state to the parallel state.

As the reversal from the parallel state to the antiparallel state isdifficult to be understood intuitively, it can be considered that whilethe magnetization M12 of the magnetization fixed layer 12 cannot bereversed because the magnetization M12 is fixed, the direction ofmagnetization M14 of the storage layer 14 should be reversed forconservation of the angular momentum of a whole system.

In such a manner, the recording of 0/1 information would be performed byallowing the current above a certain threshold to flow, in the directionfrom the magnetization fixed layer (reference layer) 12 to the storagelayer 14, or in the opposite direction. The threshold for each currentcorresponds to the polarity thereof.

Read-out of the information may be performed, as in a MRAM of the past,by using magnetoresistance effect.

That is, as in the above-described case of the recording of theinformation, a current is allowed to flow in the direction perpendicularto the film surfaces of the layers (lamination direction of the layers).Then, it uses the phenomenon that the electric resistance of the storageelement 3′ changes depending on whether the direction of magnetizationM14 of the storage layer 14 is parallel or antiparallel with respect tothe direction of magnetization M12 of the magnetization fixed layer(reference layer) 12.

The material to be used for the intermediate layer 13 as the tunnelinsulating layer may be a metal, or may be an insulating material.However, one which may provide larger readout signal (resistance changerate), and which may enable recording with lower current, is the use ofthe insulating material as the intermediate layer 13. An element of sucha case will be referred to as a ferromagnetic tunnel junction (MagneticTunnel Junction: MTJ) element.

The above-mentioned spin torque has a size that varies depending on anangle formed between the magnetization M14 of the storage layer 14 andthe magnetization M12 of the magnetization fixed layer (reference layer)12.

If a unit vector indicating the direction of magnetization M14 is m1 anda unit vector indicating the direction of magnetization M12 is m2, thesize of the spin torque will be proportional to m1×(m1×m2). The sign “×”herein means the vector product.

Usually, the magnetization M12 of the magnetization fixed layer 12 isfixed in an easy magnetization axis of the storage layer 14. Themagnetization M14 of the storage layer 14 tends to be directed along itsown easy magnetization axis. At this time, m1 and m2 would form an angleof 0 degrees (parallel) or 180 degrees (antiparallel).

FIG. 4 illustrates the directions of the magnetizations M12 and M14 in acase where m1 and m2 form an angle of 0 degrees.

In cases where the angle formed by m1 and m2 is 0 degrees or 180degrees, if it follows the above-mentioned formula of spin torque, thespin torque is not supposed to be working.

However, in actual, the magnetization M14 of the storage layer 14 isdistributed randomly around the easy magnetization axis, because of thethermal fluctuation. Accordingly, when the angle of the magnetizationM14 with respect to the magnetization M12 of the magnetization fixedlayer 12 departs from 0 degrees or 180 degrees, it may allow the spintorque to work and cause the magnetization reversal.

Magnetic materials have a magnetic energy associated with the directionof magnetization thereof. The direction which corresponds to the lowestmagnetic energy is the easy magnetization axis.

If there is no thermal fluctuation, a force (torque) which works tominimize the magnetic energy would work and cause the magnetization tobe directed along the easy magnetization axis.

On the other hand, in cases where the direction of the magnetization isdeparted from the easy magnetization axis by the thermal fluctuation,the magnetic energy becomes greater than in the case of themagnetization in the easy magnetization axis. This difference of themagnetic energies will be referred to as “excitation energy E”. When thedirection of the magnetization further departs from the easymagnetization axis and causes the excitation energy E to exceed acertain threshold, the magnetization reversal occurs.

This threshold will be referred to as “Δ (delta)”.

The above-mentioned Δ can be regarded as the energy required for causingthe reversal of the magnetization. The unit of the excitation energy Eand the Δ is joule (J), but hereinafter, the excitation energy E and theΔ will be divided by a heat energy (product of the Boltzmann constantand the absolute temperature), to be used as a dimensionless quantity.As the Δ expressed in this way can be regarded as an index whichindicates the stability of magnetization against the heat energy, the Δmay also be referred to as an “index of heat stability”.

By using the excitation energy E of the magnetization M14 of the storagelayer 14 and the index of heat stability Δ, the relation between a flowof current I in the storage layer 14 and a time required for thespin-torque magnetization reversal (reversal time) ts by this current Isatisfies the following formula.

$\begin{matrix}\left\lbrack {{Formula}1} \right\rbrack & \end{matrix}$ $\begin{matrix}{\frac{{\eta\left( {I - I_{c0}} \right)}t_{s}}{e} = {\left( \frac{M_{s}V}{\mu B} \right){\ln\left( {\frac{\pi}{2}\sqrt{\frac{\Delta}{E}}} \right)}}} & \left( {{formula}1} \right)\end{matrix}$

In the formula, Ic0 is a threshold current for causing the spin-torquemagnetization reversal; n is a spin polarization rate; e is a charge ofelectron; Ms is a saturation magnetization of the magnetization M14; Vis a volume of the storage layer 14; and μB is a Bohr magneton.

The left side of the formula corresponds to the number of spins to beinjected into the storage layer 14. The right side of the formulacorresponds to the number of spins that exist in the storage layer 14.It should be noted that this number of spins is scaled by logarithms. Asthe excitation energy E, a value corresponding to the direction of themagnetization at the time when the current was made to flow is used.

As can be seen from the formula 1, as the excitation energy E approacheszero, the reversal time ts expands infinitely. As described above, whenthere is almost no thermal fluctuation, since the magnetization M14would be directed along the easy magnetization axis, which is E=0, theexpansion of the reversal time may be a problem.

Here, the excitation energy E of a case in the presence of the thermalfluctuation will be described. The excitation energy E will be a finitevalue due to the thermal fluctuation. In cases where the storage layeris made of a single ferromagnetic layer, a probability that theexcitation energy E is smaller than a certain value X is given by:1−exp(−X).

Here, “exp” is exponential function. From the formula 1, the excitationenergy E required for the reversal in the reversal time ts when acertain current I is made to flow will be represented by X. Then, whenthe current I is made to flow for the time ts, at a probability of1−exp(−X), magnetization reversal would not occur. That is, awrite-error rate becomes 1−exp(−X). Thus, the excitation energy E isbound in close association with the write-error rate.

In order to prevent such an expansion of the reversal time, the presentdisclosure has a magnetization fixed layer configured with twoferromagnetic layers laminated interposing a coupling layertherebetween. The two adjacent ferromagnetic layers are magneticallycoupled interposing the coupling layer inserted therebetween.

According to such a configuration of the present disclosure, by themagnetic coupling between the ferromagnetic layers forming themagnetization fixed layer, a direction of magnetization of themagnetization fixed layer can be tilted from a direction perpendicularto the film surface. This makes it possible to prevent expansion of thetime required for the magnetization reversal, which expansion may bebecause of the directions of magnetization of the storage layer and themagnetization fixed layer being substantially parallel or antiparallel.

Thus, it makes it possible to perform writing of information byreversing the direction of magnetization of the storage layer in apredetermined finite time.

3. First Embodiment (Specific Configuration Example 1)

Hereinafter, some specific embodiments of the present disclosure will bedescribed.

The embodiments include a first configuration example (first embodiment)and a second configuration example (second embodiment), as specificconfiguration examples.

FIG. 5 shows a schematic diagram (cross-sectional view) of a storageelement 3 as a first embodiment.

It should be noted that the same part as what was already described inthe above will be denoted by the same reference symbols and thedescription thereof will be omitted.

In FIG. 5 , the storage element 3 of the first embodiment includes thebase layer 11, and, the magnetization fixed layer (reference layer) 12,the intermediate layer 13 (nonmagnetic layer: tunnel insulating layer),the storage layer (magnetization free layer) 14 having a direction ofmagnetization M14 which is variable, and the cap layer 15, which arelaminated on top of the base layer 11 in this order.

The storage layer 14 has an easy magnetization axis in a directionperpendicular to the film surface (in an upward direction of the figurein this case). The magnetization M14 of the storage layer 14 directs inthe direction perpendicular to the film surface.

The configuration described so far is similar to that of the storageelement 3′.

Furthermore, in the storage element 3 of this embodiment, themagnetization fixed layer 12 is made of a multilayer film having aplurality of ferromagnetic layers and a coupling layer being laminated.Specifically, the magnetization fixed layer 12 in this case is made of athree-layered structure having a ferromagnetic layer 12 a, a couplinglayer 12 b and a ferromagnetic layer 12 c as shown in the figure. Insuch a configuration, magnetization M1 of the ferromagnetic layer 12 aand magnetization M2 of the ferromagnetic layer 12 c are magneticallycoupled interposing the coupling layer 12 b therebetween. As thecoupling layer 12 b, a nonmagnetic metal such as Ta and Ru may be used.

A material that can be used as the intermediate layer 13 between themagnetization fixed layer 12 and the storage layer 14 may be aninsulating material for forming a tunnel insulating film (various oxidesor the like), or, a nonmagnetic metal which is used between magneticlayers of a magneto-resistive element.

When an insulating material is used as the material of the intermediatelayer 13, as described above, it makes it possible to provide largerreadout signal (resistance change rate), and enable recording with lowercurrent.

For the magnetization fixed layer 12 and the storage layer 14, a varietyof magnetic materials as those that have been used in the MTJ of theSTT-MRAMs in the past can be used.

For example, CoFe or CoFeB may be used as the magnetization fixed layer12 and the storage layer 14.

Otherwise, materials such as NiFe, Te Pt, CoPt, TbFeCo, GdFeCo, CoPd,MnBi, MnGa, PtMnSb and Co—Cr materials may be employed. In addition,magnetic materials other than these may also be used.

Read-out of the information may be performed by using magnetoresistanceeffect.

That is, as in the above-described case of the recording of theinformation, a current is allowed to flow in the direction perpendicularto the film surfaces of the layers (lamination direction of the layers).Then, it uses the phenomenon that the electric resistance of the storageelement changes depending on a relative angle formed by themagnetization M12 of the magnetization fixed layer 12 and themagnetization M14 of the storage layer 14, which layers are adjacent toeach other interposing the intermediate layer 13.

FIG. 6 illustrate the configuration of the magnetization fixed layer 12of this example in more detail.

Specifically, FIG. 6A is a perspective view of the magnetization fixedlayer 12. FIG. 6B is a top view of the magnetization fixed layer 12. Forsimplification, here, the coupling layer 12 b is omitted.

In the storage element 3 of this embodiment, the shape of themagnetization fixed layer 12 may be a cylindrical shape. However, anelliptical shape, a rectangular shape and other shapes are alsopossible. Here, in order to describe the directions of themagnetizations M1 and M2, the following angles θ1, θ2, φ1 and φ2 will bedefined.

First, in the perspective view of FIG. 6A, a vertical axis aVpenetrating the magnetization fixed layer 12 in a directionperpendicular thereto is shown. The vertical axis aV corresponds to theeasy magnetization axis of the storage layer 14. An angle formed by themagnetization M1 and the vertical axis aV is defined as θ1. An angleformed by the magnetization M2 and the vertical axis aV is defined asθ2.

Further, in the top view of FIG. 6B, a reference line aH which passesthrough the center of the ferromagnetic layers 12 a and 12 c is shown.As cross-sectional shapes of the ferromagnetic layers 12 a and 12 c aresubstantially circular shapes, a direction of the reference line aH maybe arbitrarily selected. If the magnetizations M1 and M2 are supposed tobe projected on the film surface, an angle formed by the magnetizationM1 and the reference line aH is defined as φ1, and an angle formed bythe magnetization M2 and the reference line aH is defined as φ2.

As described above, magnetic materials have a magnetic energy associatedwith the direction of magnetization thereof. The following values willbe defined in order to describe the magnetic energy.

That is, an energy difference calculated by subtracting a magneticenergy in a state where the magnetization M1 is directed perpendicularly(θ1=90 degrees) to the film surface, from a magnetic energy in a statewhere the magnetization M1 is directed within the film surface (θ1=0degrees), is defined as Δ1.

An energy difference calculated by subtracting a magnetic energy in astate where the magnetization M2 is directed perpendicularly (θ2=90degrees) to the film surface, from a magnetic energy in a state wherethe magnetization M2 is directed within the film surface (θ2=0 degrees),is defined as Δ2.

Furthermore, an intensity of a magnetic coupling energy of themagnetization M1 and the magnetization M2 is defined as Δex.

The unit of Δ1, Δ2 and Δex are joule (J), but in the same manner as forthe excitation energy E and the index of heat stability Δ, these will bedivided by a heat energy (product of the Boltzmann constant and theabsolute temperature), to be used as a dimensionless quantity.

In the storage element 3′ of the past, the direction of magnetization ofthe magnetization fixed layer 12 has been fixed along the easymagnetization axis of the storage layer 14 (see the magnetization M12 ofFIG. 4 ). This would cause the directions of magnetization of themagnetization fixed layer 12 and the storage layer 14 to be the samedirection, and would lead to increase in the reversal time.

However, as a result of carrying out various examinations, it was foundthat, with the configuration of the magnetization fixed layer 12according to the embodiment as shown in FIG. 5 , the angles of themagnetizations M1 and M2 with respect to the easy magnetization axis,which is the vertical axis aV, of the storage layer 14 may also be someangles other than parallel (0 degrees) or antiparallel (180 degrees). Inother words, the directions of the magnetizations M1 and M2 may beoblique directions.

In such cases, it can be expected that since the directions of themagnetization M12 of the magnetization fixed layer 12 and themagnetization M14 of the storage layer 14 form a finite angle, the spintorque would not become zero, and thus the increase of the reversal timemay be suppressed.

Here, as a result of carrying out various examinations regardingconditions where the directions of the magnetizations would be obliqueto each other, the following findings were revealed.

First, a case where the intensity of the magnetic coupling energy Δex ofthe magnetization M1 and the magnetization M2 is zero, that is, a casewhere each of the magnetization M1 and the magnetization M2 movesindependently, will be assumed.

From the definition, in cases where Δ1 is positive, an easymagnetization axis of the magnetization M1 is perpendicular to the filmsurface, and the magnetization M1 directs in the direction perpendicularto the film surface. Conversely, in cases where Δ1 is negative, the easymagnetization axis of the magnetization M1 is within the film surface,and the magnetization M1 is directed within the film surface. In thesecases, since the ferromagnetic layer 12 a is isotropic with respect torotation around the vertical axis, the value of φ1 may be an arbitraryvalue.

Similarly, in cases where Δ2 is positive, an easy magnetization axis ofthe magnetization M2 is perpendicular to the film surface, and themagnetization M2 directs in the direction perpendicular to the filmsurface. Conversely, in cases where Δ2 is negative, the easymagnetization axis of the magnetization M2 is within the film surface,and the magnetization M2 is directed within the film surface. In thesecases, since the ferromagnetic layer 12 c is isotropic with respect torotation around the vertical axis, the value of φ2 may be an arbitraryvalue.

Next, a case where the intensity of the magnetic coupling energy Δex ofthe magnetization M1 and the magnetization M2 is other than zero, whereeach of the magnetization M1 and the magnetization M2 moves inconnection with each other, which is an original case of the presentdisclosure, will be assumed.

From the definition, in cases where Δex is positive, the directions ofthe magnetizations M1 and M2 tries to be parallel. Conversely, in caseswhere Δex is negative, the directions of the magnetizations M1 and M2tries to be antiparallel. The former may be referred to as“ferromagnetic coupling” and the latter may be referred to as“antiferromagnetic coupling”.

In the following discussion, for ease of illustration, the cases whereΔex is positive will be considered. However, the same discussion holdstrue in the cases where Δex is negative.

Incidentally, if Δex is positive, it shows φ1−φ2=0. If Δex is negative,it shows φ1−φ2=180 degrees.

In cases where Δ1 and Δ2 are both positive, a magnetization angle wouldbe parallel to the vertical axis, regardless of magnitude of Δex. Thiswould be the same as in the storage layer 3′ having the magnetizationfixed layer 12 that has been described with reference to FIG. 4 , andthe increase of the reversal time might be inevitable.

On the other hand, in cases where Δ1 and Δ2 are both negative, themagnetization angle would be within the film surface, regardless ofmagnitude of Δex. This would cause the relative angle formed by themagnetization M2 of the ferromagnetic layer 12 c and the magnetizationM14 of the storage layer 14 to be constant at 90 degrees, regardless ofthe value of φ2. Because of this, changes in resistance bymagnetoresistance effect would not occur, and therefore, the informationis not able to be read out. This might not be able to be used as astorage element which makes up a STT-MRAM.

Thus, as described above, in the storage element according to thepresent disclosure, Δ1 and Δ2 are supposed to have different signs.

In cases where Δ1 and Δ2 have different signs in this way, amagnetization of one ferromagnetic layer would have an easymagnetization axis perpendicular to the film surface, and amagnetization of another ferromagnetic layer would have an easymagnetization axis within the film surface. By coupling, with Δex, thesetwo magnetizations having the directions competing with each other, itis possible to tilt these magnetizations into oblique directions.

However, it should be noted that there is an upper limit of Δex. If Δexwere to have infinite magnitude, the magnetizations M1 and M2 should beparallel to each other; and in such a case, the easy magnetization axisin total would become perpendicular to the film surface or within thefilm surface, depending on magnitude relationship of Δ1 and Δ2. Even incases where Δex is not infinite, when Δex is greater than or equal to acertain value, the magnetizations M1 and M2 would be parallel to eachother.

In view of this, in order to find the upper limit of Δex, the valuesΔex_(max) as the upper limit thereof which makes the magnetizations M1and M2 parallel were calculated with respect to various combinations ofΔ1 and Δ2.

FIG. 7 shows one example of the results.

In FIG. 7 , Δ2 was fixed to −40 and Δ1 was changed from 0 to 100. Awhite circle indicates an upper limit of Δex found by calculation. WhenΔex is smaller than this value, the magnetizations M1 and M2 may beoblique directions. The Δ1-dependency of Δex_(max) may differ accordingto whether Δ1+Δ2 is smaller or greater in comparison to zero. A curveC41 is the Δ1-dependency of Δex_(max) in cases where Δ1+Δ2 is smallerthan zero. A curve C42 is the Δ1-dependency of Δex_(max) in cases whereΔ1+Δ2 is greater than zero.

By searching a formula that can fit to these curves, the curves C41 andC42 were both revealed to be expressible by:Δex_(max)=abs(2×Δ1×Δ2/(Δ1+Δ2))  (formula 2).

Here, abs is a function that returns an absolute value. Although thecases where Δex is positive are considered here, the same formulaapplies to the cases where Δex is negative.

After all, the condition for making the magnetizations M1 and M2 intothe oblique direction would be, from the above formula 2, as follows:abs(Δex)<abs(2×Δ1×Δ2/(Δ1+Δ2))  (formula 3).

From the above, the condition for making the magnetizations M1 and M2into the oblique direction was revealed. When Δ1, Δ2 and Δex whichsatisfy this condition are provided, it makes it possible to realize themagnetization fixed layer 12 with its magnetization tilted to obliquedirection from the easy magnetization axis of the storage layer 14.

In other words, the magnetization fixed layer 12 of this embodiment isconfigured to have different signs of Δ1 and Δ2, and also have Δ1, Δ2and Δex which satisfy the condition of the above formula 3.

According to the first embodiment as described above, the magnetizationfixed layer 12 in each storage element 3 which makes up a memory cell ofa storage apparatus has a laminated structure of the ferromagnetic layer12 a, the coupling layer 12 b and the ferromagnetic layer 12 c.

By making it into the laminated structure, the magnetization M1 of theferromagnetic layer 12 a and the magnetization M2 of the ferromagneticlayer 12 c may have the directions tilted from the directionperpendicular to the film surface.

This can avoid a phenomenon that the spin torque to the magnetizationsM1 and M2 does not work.

Therefore, it makes it possible to record information by reversing thedirections of magnetizations M1 and M2 in a predetermined finite time.

Accordingly, with this embodiment, as it makes it possible to performwriting of information by reversing the direction of magnetization ofthe storage layer in a predetermined time, write errors can be reducedand writing operation may be made in a shorter time.

Since the write errors can be reduced, it can improve reliability ofwriting operation.

Further, since the writing operation may be made in a shorter time, itcan realize high-speed operation.

Therefore, it makes it possible to realize a storage apparatus and astorage apparatus which are highly reliable in writing operation andoperate at high speed.

4. Second Embodiment (Specific Configuration Example 2)

Next, a second embodiment will be described.

FIG. 8 is a schematic diagram (cross-sectional view) of a storageelement 20 of a second embodiment.

The storage element 20 of the second embodiment is different from thestorage element 3 of the first embodiment shown in FIG. 5 above, in thatthe magnetization fixed layer 12 was replaced with a magnetization fixedlayer 21.

The magnetization fixed layer 21 of the storage element 20 is made of afour-layered structure having an antiferromagnetic layer 21 p, theferromagnetic layer 12 a, the coupling layer 12 b and the ferromagneticlayer 12 c being laminated in this order.

The antiferromagnetic layer 21 p is provided for fixing the direction ofmagnetization in the film surface of the magnetization fixed layer 21.An orientation vector Mp in the figure shows the direction in which themagnetization would be fixed, and the direction is within the filmsurface.

As described above, the intensity of the magnetic coupling energy of themagnetization M1 and the magnetization M2 is Δex. Similarly, theintensity of the magnetic coupling energy of the magnetization M1 andthe antiferromagnetic layer 21 p will be Δpin. This Δpin will also beused as a dimensionless quantity by being divided by a heat energy(product of the Boltzmann constant and the absolute temperature).

FIG. 9 illustrate the configuration of the magnetization fixed layer 21in more detail. FIG. 9A is a perspective view of the magnetization fixedlayer 21. FIG. 9B is a top view of the magnetization fixed layer 21. Forsimplification, here, the coupling layer 12 b is omitted, in the samemanner as in the case of FIG. 6 .

Similarly to the magnetization fixed layer 12, the shape of themagnetization fixed layer 21 may be a cylindrical shape. However, anelliptical shape, a rectangular shape and other shapes are alsopossible.

Here, in order to describe the directions of the magnetizations M1 andM2, the following angles θ1, θ2, φ1 and φ2 will be defined. In theperspective view of FIG. 9A, a vertical axis aV penetrating themagnetization fixed layer 21 in a direction perpendicular thereto isshown. The vertical axis aV corresponds to the easy magnetization axisof the storage layer 14. An angle formed by the magnetization M1 and thevertical axis aV is defined as θ1. An angle formed by the magnetizationM2 and the vertical axis aV is defined as θ2.

Further, in FIGS. 9A and 9B, a reference line aH which passes throughthe center of the ferromagnetic layers 21 a and 21 c is shown. As thereference line aH, the line which corresponds to the orientation vectorMp is selected. If the magnetizations M1 and M2 are supposed to beprojected on the film surface, an angle formed by the magnetization M1and the reference line aH is defined as φ1, and an angle formed by themagnetization M2 and the reference line aH is defined as φ2.

In the above-described first embodiment, the angles θ1 and θ2 of themagnetizations M1 and M2 of the magnetization fixed layer 12 withrespect to the vertical axis aV were fixed, but the angles φ1 and φ2around the vertical axis aV were not fixed.

Now, the rings of dotted lines shown in the perspective view of FIG. 9Aindicate the respective loci of the magnetizations M1 and M2. Themagnetizations M1 and M2 may be oriented at any direction on the dottedlines (with the proviso that if Δex is positive, it satisfies thecondition of φ1−φ2=0; and if Δex is negative, it satisfies the conditionof φ1−φ2=180 degrees).

In the second embodiment, the angles φ1 and φ2, around the vertical axisaV, of the magnetizations M1 and M2 of the magnetization fixed layer 21are fixed by the antiferromagnetic layer 21 p.

In FIG. 9B, the angles φ1 and φ2 around the vertical axis aV are theangles with respect to the orientation vector Mp which indicates thedirection in which the magnetization is fixed. Then, since themagnetization M1 is fixed in the direction of the orientation vector Mpby the antiferromagnetic layer 21 p, it shows φ1=0. Since themagnetization M2 is magnetically coupled to the magnetization M1 via thecoupling layer 12 b, if Δex is positive, it shows φ2=0; and if Δex isnegative, it shows φ2=180 degrees.

In such a manner, the storage element 20 of the second embodiment makesit possible to fix the angles, around the vertical axis aV, of themagnetizations M1 and M2 of the magnetization fixed layer 21 (angleswithin the film surface), in a certain direction.

By fixing the angles of the magnetizations M1 and M2 around the verticalaxis aV, it allows magnitude of an inversion current to be reduced. Thatis, it makes it possible to reduce the value of the threshold current(Ico in the FIG. 1 ) for causing the spin-torque magnetization reversal.

5. Simulation Result

A simulation was carried out in order to reveal an effect of the storageelements (3 and 20) of each of the above-described embodiments.

FIG. 10 shows a relationship between the excitation energy E and thereversal time ts, at a certain current. The abscissa was expressed byln[(π/2)(Δ/E)1/2], by following the formula 1. Further, the Δ of thestorage layer 14 was 60.

As the excitation energy E, a value calculated based on the direction ofthe magnetization at the time when the current was made to flow in thestorage element would be used. The direction of the magnetization may beshifted from a state of equilibrium due to the thermal fluctuation. Alarger excitation energy E (leftward in FIG. 10 ) indicates larger shiftthereof.

In the storage element 3′ of the past, the relationship between theexcitation energy E and the reversal time is would be expressed by theabove formula 1. A curve C1 shows the simulation result regarding thestorage element 3′ of the past. If the abscissa is scaled by thelogarithm of the excitation energy E, the curve C1 becomes almostlinear. It can be seen that the larger the excitation energy E is, theshorter the time for reversal becomes.

Now, a case where a supply time of current is 20 ns is assumed. Then, anintersection with the curve C1 will be a point P3. The value of theabscissa at this point is about 11.5. If the excitation energy E iscalculated from this, and if the write error rate is also calculated,the write error rate becomes 1.5×10⁻⁸.

Since the number of writing times which may be required for a randomaccess memory is about 10¹⁵ times, this value of write error rate is notnegligible. In a supply time of another current, as the position of thepoint P3 changes, the write error rate would change according to that.

In such a manner, in the storage element 3′ of the past, the write errorrate would change according to the supply time of the current. Theshorter the supply time of the current is, the greater the write errorrate becomes.

In contrast, the relationship between the excitation energy E and thereversal time ts in cases where a storage element according to anembodiment of the present disclosure was used is indicated by a curveC2.

It should be noted that the curve C2 shows an example of calculationregarding a case where the storage element 20 of the second embodimentwas used. In this case, the direction of the magnetization M2 of theferromagnetic layer 12 c was assumed to be tilted by 5 degrees from thevertical axis.

Referring to this curve C2, different from the curve C1 for the storageelement 3′ of the past, it can be seen that an increase in the reversaltime ts when the excitation energy E decreased was stopped at about 10ns. This is because, since the direction of the magnetization M2 istilted from the direction of the magnetization M14 of the storage layer14 (vertical axis) even when the excitation energy E is zero (positiveinfinity in the abscissa of FIG. 10 ), a finite spin torque would work.

In the example of calculation illustrated by the curve C2 of FIG. 10 ,when the value of the abscissa was about 5 or more, the reversal time tswas about 10 ns and was substantially constant. This means thatregardless of whichever direction the magnetization M14 of the storagelayer 14 is oriented to at the time when the current is made to flow,the reversal time ts is not likely to exceed 10 ns.

In such a manner, in the storage element of the embodiment, an upperlimit of the reversal time ts (as 10 ns in the example of calculation inFIG. 10 ) may be determined regardless of the direction of themagnetization at the time when the current is made to flow. Therefore,when the supply time of the current is greater than or equal to thisupper limit value, writing may be performed without generating writeerrors.

From this point of view as well, it can be seen that the storage elementof the embodiment makes it possible to realize writing operation in ashorter time than in the storage element 3′ of the past, withoutgenerating write errors.

It should be noted that although FIG. 10 showed a simulation resultregarding the case where the storage element 20 of the second embodimentwas used, substantially the same result would also be obtained in thecase where the storage element 3 of the first embodiment was used.

6. Variation Examples

As described above, some embodiments according to the present disclosurehave been illustrated. However, the present disclosure should not belimited to the specific examples illustrated above.

For example, in the description so far, some cases of applying, to thelaminated structure of the ferromagnetic layer and the coupling layer inthe magnetic fixed layer 12 of the storage element 3 or 20, thethree-layered structure of the ferromagnetic layer 12 a, the couplinglayer 12 b and the ferromagnetic layer 12 c, have been illustrated.However, any number of layers, other than the three-layered structure aswell, may be applied to the laminated structure.

Further, in the description so far, as the laminated structure regardingthe whole storage element, a laminated structure in which at least themagnetization fixed layer 12 (21), the intermediate layer 13 and thestorage layer 14 were disposed in this order from the lower layer, wasemployed. However, in a storage element of the present disclosure, thearrangement of the layers in the reversed order is also possible.

In addition, although the structure of the storage element 3 or thestorage element 20 according to the present disclosure is configured asa magneto-resistive element such as TMR elements, this magneto-resistiveelement as a TMR element may be applied to apparatuses other than theabove-described storage apparatus. It can be applied to a magnetic headand a hard disk drive equipped with this magnetic head; an integratedcircuit chip; and various electronic apparatuses and electricapparatuses such as a personal computer, a mobile terminal, a mobilephone and a magnetic sensor apparatus.

As an example, FIGS. 11A and 11B show a case where a magneto-resistiveelement 101 having a structure of the above-described storage element 3or 20 is applied to a composite magnetic head 100. It should be notedthat FIG. 11A is a perspective view showing the composite magnetic head100 in a form with its part cut out so that an internal structurethereof can be understood. FIG. 11B is a cross-sectional view of thecomposite magnetic head 100.

The composite magnetic head 100 is a magnetic head which is used in ahard disk apparatus or the like. The composite magnetic head 100 is madewith a magneto-resistive magnetic head according to the presentdisclosure formed on a substrate 122, and with an inductive magnetichead formed by lamination on the magneto-resistive magnetic head. Here,the magneto-resistive magnetic head operates as a reproducing head andthe inductive magnetic head operates as a recording head. That is, thecomposite magnetic head 100 is configured by combining a reproducinghead and a recording head.

The magneto-resistive magnetic head mounted on the composite magnetichead 100 is a so-called shielded MR head, and includes a first magneticshield 125 formed over the substrate 122 with an insulating layer 123interposed between the substrate 122 and the first magnetic shield 125;the magneto-resistive element 101 formed over the first magnetic shield125 with the insulating layer 123 interposed between the first magneticshield 125 and the magneto-resistive element 101; and a second magneticshield 127 formed over the magneto-resistive element 101 with theinsulating layer 123 interposed between the magneto-resistive element101 and the second magnetic shield 127. The insulating layer 123 may bemade of an insulating material such as Al₂O₃ and SiO₂.

The first magnetic shield 125 is provided for magnetically shieldinglower layers with respect to the magneto-resistive element 101. Thefirst magnetic shield 125 may be made of a soft magnetic material suchas Ni—Fe. Over this first magnetic shield 125, the magneto-resistiveelement 101 is formed interposing the insulating layer 123.

The magneto-resistive element 101 in this magneto-resistive magnetichead would function as a magneto-sensitive element for detectingmagnetic signals from a magnetic recording medium. Thismagneto-resistive element 101 may have substantially the same filmstructure (layer structure) as the above-described storage element 3 or20.

This magneto-resistive element 101 may be formed in a substantiallyrectangular shape, and one side surface thereof is exposed to a magneticrecording medium facing surface. In addition, bias layers 128 and 129are disposed at both ends of the magneto-resistive element 101. Further,connection terminals 130 and 131 connected to the respective bias layers128 and 129 are formed. Through the connection terminals 130 and 131, asense current would be supplied to the magneto-resistive element 101.

Furthermore, above the bias layers 128 and 129, a layer of the secondmagnetic shield 127 is provided interposing the insulating layer 123.

The inductive magnetic head formed by lamination on such amagneto-resistive magnetic head includes a magnetic core and a thin filmcoil 133. The magnetic core is made up of the second magnetic shield 127and an upper core 132. The thin film coil 133 is formed wound around themagnetic core.

The upper core 132 would form a closed magnetic circuit with the secondmagnetic shield 122 to serve as the magnetic core of this inductivemagnetic head. The upper core 132 made of a soft magnetic material suchas Ni—Fe. Here, the second magnetic shield 127 and the upper core 132are formed so that their front end portions are exposed to the magneticrecording medium facing surface, and, so that the second magnetic shield127 and the upper core 132 are in contact with each other at their rearend portions. The front end portions of the second magnetic shield 127and the upper core 132 are formed so that, in the magnetic recordingmedium facing surface, the second magnetic shield 127 and the upper core132 are spaced from each other by a predetermined gap g.

That is, in this composite magnetic head 100, the second magnetic shield127 would also serve as a magnetic core of an inductive magnetic head,in addition to magnetically shielding upper layers with respect to themagneto-resistive element 101. The magnetic core of the inductivemagnetic head is made up of the second magnetic shield 127 and the uppercore 132. Further, the gap g would be a magnetic recording gap of theinductive magnetic head.

In addition, above the second magnetic shield 127, the thin film coil133 is formed embedded in the insulating layer 123. Here, the thin filmcoil 133 is formed wound around the magnetic core made up of the secondmagnetic shield 127 and the upper core 132. Although not shown in thefigure, both ends of the thin film coil 133 are exposed to the outside.Terminals formed at the both ends of the thin film coil 133 would beexternal connection terminals of this inductive magnetic head. That is,at the time of recording magnetic signals to the magnetic recordingmedium, a recording current would be supplied to the thin film coil 132from these external connection terminals.

As described above, a laminated structure as the storage element of thepresent disclosure may be applied to a reproducing head for a magneticrecording medium, that is, a magneto-sensitive element for detectingmagnetic signals from a magnetic recording medium.

In addition, the present disclosure may employ the followingconfiguration.

(1) A storage element including

a layer structure at least including

-   -   a storage layer having a direction of magnetization to be        changed according to information,    -   a magnetization fixed layer having a fixed direction of        magnetization, the magnetization fixed layer having two        ferromagnetic layers laminated interposing a coupling layer        therebetween, the ferromagnetic layers being magnetically        coupled interposing the coupling layer, the ferromagnetic layers        having a direction of magnetization being tilted from a        direction perpendicular to a film surface; and    -   an intermediate layer containing a nonmagnetic material disposed        between the storage layer and the magnetization fixed layer,

in which recording of the information is to be performed by allowing acurrent to flow in the layer structure in its lamination direction tocause change in the direction of magnetization of the storage layer.

(2) The storage element according to (1), in which

the magnetization fixed layer has a first ferromagnetic layer, thecoupling layer and a second ferromagnetic layer being laminated in thisorder,

the first ferromagnetic layer has a first magnetic energy which isdefined to have a value calculated by subtracting a magnetic energy in astate where magnetization of the first ferromagnetic layer isperpendicular to its film surface, from a magnetic energy in a statewhere magnetization of the first ferromagnetic layer is within its filmsurface,

the second ferromagnetic layer has a second magnetic energy which isdefined to have a value calculated by subtracting a magnetic energy in astate where magnetization of the second ferromagnetic layer isperpendicular to its film surface, from a magnetic energy in a statewhere magnetization of the second ferromagnetic layer is within its filmsurface, and

the first magnetic energy and the second magnetic energy have valueswith different signs.

(3) The storage element according to (2), in which

a magnetic coupling energy of the first ferromagnetic layer and thesecond ferromagnetic layer interposing the coupling layer is defined asan interlayer magnetic coupling energy, and

an absolute value of the interlayer magnetic coupling energy is smallerthan an absolute value of twice the value calculated by dividing theproduct of the first magnetic energy and the second magnetic energy, bythe sum of the first magnetic energy and the second magnetic energy.

(4) The storage element according to (1), in which

the magnetization fixed layer further includes an antiferromagneticlayer.

(5) The storage element according to (4), in which

the magnetization fixed layer has the antiferromagnetic layer, a firstferromagnetic layer, the coupling layer and a second ferromagnetic layerbeing laminated in this order,

the first ferromagnetic layer has a first magnetic energy which isdefined to have a value calculated by subtracting a magnetic energy in astate where magnetization of the first ferromagnetic layer isperpendicular to its film surface, from a magnetic energy in a statewhere magnetization of the first ferromagnetic layer is within its filmsurface,

the second ferromagnetic layer has a second magnetic energy which isdefined to have a value calculated by subtracting a magnetic energy in astate where magnetization of the second ferromagnetic layer isperpendicular to its film surface, from a magnetic energy in a statewhere magnetization of the second ferromagnetic layer is within its filmsurface, and

the first magnetic energy and the second magnetic energy have valueswith different signs.

(6) The storage element according to (5), in which

magnetization of the antiferromagnetic layer and magnetization of thefirst ferromagnetic layer are magnetically coupled, and a direction ofmagnetization of the first ferromagnetic layer within the film surfaceis fixed.

(7) A storage apparatus including:

a storage element having a layer structure at least including

-   -   a storage layer having a direction of magnetization to be        changed according to information,    -   a magnetization fixed layer having a fixed direction of        magnetization, the magnetization fixed layer having two        ferromagnetic layers laminated interposing a coupling layer        therebetween, the ferromagnetic layers being magnetically        coupled interposing the coupling layer, the ferromagnetic layers        having a direction of magnetization being tilted from a        direction perpendicular to a film surface; and    -   an intermediate layer containing a nonmagnetic material disposed        between the storage layer and the magnetization fixed layer,    -   in which recording of the information is to be performed by        allowing a current to flow in the layer structure in its        lamination direction to cause change in the direction of        magnetization of the storage layer;

a wiring portion for supplying a current which flows in the laminationdirection to the storage element; and

a current supply control section for controlling supply of the currentto the storage element via the wiring portion.

DESCRIPTION OF REFERENCE SYMBOLS

-   1 gate electrode-   2 element isolation layer-   3, 20 storage element-   4 contact layer-   6 bit line-   7 source region-   8 drain region-   9 wiring-   10 semiconductor substrate-   11 base layer-   12, 21 magnetization fixed layer-   12 a, 12 c ferromagnetic layer-   12 b coupling layer-   13 intermediate layer-   14 storage layer-   15 cap layer-   21 p antiferromagnetic layer

The invention claimed is:
 1. A storage apparatus comprising: asubstrate; and a storage element, the storage element comprising astorage layer, a magnetization layer and an intermediate layer, whereinthe magnetization layer includes a first ferromagnetic layer, a secondferromagnetic layer and a coupling layer between the first ferromagneticlayer and the second ferromagnetic layer, the intermediate layerincludes a nonmagnetic layer between the storage layer and themagnetization layer, the magnetization layer includes the firstferromagnetic layer, the coupling layer and the second ferromagneticlayer laminated in order in a first direction, the first ferromagneticlayer is configured to accommodate a first angle of magnetization in across-section perspective perpendicular to the first direction, thesecond ferromagnetic layer is configured to accommodate a second angleof magnetization in the cross-section perspective, the first and secondferromagnetic layers are arranged to accommodate the first angle beingdifferent from the second angle, the first ferromagnetic layer isconfigured to accommodate a third angle of magnetization in a plan viewperspective perpendicular to the cross-section perspective, the secondferromagnetic layer is configured to accommodate a fourth angle ofmagnetization in the plan view perspective, and the first and secondferromagnetic layers are arranged to accommodate the third angle beingdifferent from the fourth angle.
 2. The storage apparatus according toclaim 1, wherein the magnetization layer further includes anantiferromagnetic layer.
 3. The storage apparatus according to claim 2,wherein the magnetization layer includes the antiferromagnetic layer,the first ferromagnetic layer, the coupling layer and the secondferromagnetic layer laminated in order.
 4. The storage apparatusaccording to claim 3, wherein magnetization of the antiferromagneticlayer and magnetization of the first ferromagnetic layer aremagnetically coupled, and a direction of magnetization of the firstferromagnetic layer within the film surface is fixed.
 5. The storageapparatus according to claim 1, further comprising: a first magneticshielding layer formed between the substrate and the storage element. 6.The storage apparatus according to claim 5, further comprising: a secondmagnetic shielding layer formed above the storage element.
 7. Thestorage apparatus according to claim 1, further comprising: first andsecond bias layers arranged at opposite sides of the storage element. 8.The storage apparatus according to claim 6, further comprising: firstand second connection wirings respectively connected to the first andsecond bias layers, the first and second connection wirings beingconfigured for supplying a sense current to the storage element.